CVD金刚石薄膜的应力研究

Study on Stress in Chemical Vapor Deposite (CVD) Diamond Films

1.
Department of Chemistry and Chemical Engineering, Hunan University, Changsha 410082, China;
2.
Material Test and Research Center, Hunan University, Changsha 410082, China

摘要: 利用X射线衍射研究了化学气相沉积的金刚石薄膜的应力情况。研究表明：热应力在研究范围内为压应力，本征应力是张应力。分析了薄膜厚度、生长温度、碳源浓度等实验参数对薄膜应力的影响。
- 化学气相沉积 /
- 金刚石薄膜 /
- X射线衍射 /
- 应力
Abstract: The stress in diamond films by the hot filament assisted chemical vapor deposition process was studied by X-ray diffraction technique. The investigation shows that the thermal stress is compressive in the temperature range studied and the intrinsic stress is tensile. The influence of various experimental parameters on the stress in films was analyzed.
- chemical vapor deposition /
- diamond films /
- X-ray diffraction /
- stress