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Volume 30 Issue 5
Aug 2016
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Chinese Journal of High Pressure Physics  > 2016  >  30(5): 375-379.
QIN Zhen-Xing, ZHANG Jian-Bo. Raman Scattering Investigation of Tetramethylsilane under High Pressure[J]. Chinese Journal of High Pressure Physics, 2016, 30(5): 375-379. doi: 10.11858/gywlxb.2016.05.005
Citation: QIN Zhen-Xing, ZHANG Jian-Bo. Raman Scattering Investigation of Tetramethylsilane under High Pressure[J]. Chinese Journal of High Pressure Physics, 2016, 30(5): 375-379. doi: 10.11858/gywlxb.2016.05.005
shu

Raman Scattering Investigation of Tetramethylsilane under High Pressure

doi: 10.11858/gywlxb.2016.05.005
  • 1.

    Department of Physics, Taiyuan University of Science and Technology, Taiyuan 030024, China

  • 2.

    Department of Physics, South China University of Technology, Guangzhou 510641, China

  • Received Date: 18 Sep 2015
  • Rev Recd Date: 23 Nov 2015
    Abstract
  • The vibrational and structural properties of tetramethylsilane were investigated using the Raman scattering measurements under pressures ranging from 68.9 to 142.2 GPa and at room temperature.The results revealed that 3 vibrational modes of tetramethylsilane under 68.9 GPa remain locked in a certain position and are quite stable upon compression to 142.2 GPa.Moreover, new vibrational modes appear with the pressure going up to 72.2 GPa and all exhibit softening with further compression, suggesting that tetramethylsilane will become semi-metallic under such high pressures.

     

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