Nitrogen Aggregation Induced by High-Pressure High-Temperature Pretreatment and Its Effect on the Apparent Charge-State Ratio of NV Centers in Diamond
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摘要: 针对高温高压(high-pressure high-temperature, HPHT)法合成的Ⅰb型金刚石中氮空位(nitrogen vacancy,NV)色心形成及电荷态调控问题,比较了初始替位氮含量(C心氮)、电子辐照、真空退火和HPHT预处理对NV色心发光行为的影响。选取2组不同C心氮含量的HPHT金刚石单晶样品,通过电子辐照、600~
1000 ℃真空退火以及5 GPa、1100 ~1900 ℃的HPHT预处理,结合红外吸收光谱、Raman光谱和光致发光光谱分析氮聚集、晶格状态及NV色心发光响应。结果表明:高氮样品更易形成明显的NV相关发光,低氮样品中辐照空位更易以GR1色心形式保留;随着真空退火温度升高,中性态NV0和负电态NV−发光整体增强,但NV−相对于NV0的表观发光响应整体下降。HPHT预处理本身未直接生成大量NV色心,但可促进氮聚集,并改变后续辐照和退火过程中NV−/NV0的表观电荷态比。结果表明,HPHT预处理可作为调控辐照前缺陷初态及后续NV色心电荷态比的前置工艺。Abstract: Formation of nitrogen-vacancy (NV) centers and their apparent charge-state response in high-pressure high-temperature (HPHT) type-Ⅰb diamond were investigated. Effects of the initial substitutional nitrogen content (C-center nitrogen), electron irradiation, vacuum annealing, and HPHT pretreatment on the photoluminescence (PL) behavior of NV centers were compared. Two groups of HPHT diamond single crystals with different C-center nitrogen contents were subjected to electron irradiation, vacuum annealing (600−1000 ℃), and HPHT pretreatment (5 GPa,1100 −1900 ℃). Fourier-transform infrared spectroscopy (FTIR), Raman spectroscopy, and photoluminescence spectroscopy were employed to analyze nitrogen aggregation, lattice state, and NV-related photoluminescence responses. The results show that high-nitrogen samples exhibit more pronounced NV-related emission, whereas irradiation-induced vacancies in the low-nitrogen samples tend to remain as GR1 centers. As the vacuum annealing temperature increases, the overall emission intensities of NV0 and NV− increase, while the apparent photoluminescence response of NV− relative to NV0 generally decreases. HPHT pretreatment does not directly generate a large number of NV centers but promotes nitrogen aggregation and modifies the apparent NV−/NV0 charge-state ratio during subsequent irradiation and annealing. These results indicate that HPHT pretreatment can serve as a preceding processing parameter for regulating the initial defect state before irradiation and the subsequent apparent charge-state ratio of NV centers. -
表 1 辐照-真空退火样品的残余应力及表观电荷态比
Table 1. Residual stress and apparent charge-state ratio of samples treated by irradiation and vacuum annealing
Sample Ta/℃ $ {\sigma }_{\text{h}} $/GPa $ {R}_{i} $ Sample Ta/℃ $ {\sigma }_{\text{h}} $/GPa $ {R}_{i} $ A0 −0.291 2.31 B0 −0.283 0.17 A1 0.101 4.36 B1 0.085 0.76 A600 600 0.931 57.57 B600 600 0.405 2.21 A700 700 0.611 14.53 B700 700 0.550 1.66 A800 800 0.451 3.35 B800 800 0.617 0.89 A900 900 0.449 0.71 B900 900 0.416 0.06 A1000 1000 0.353 0.33 B1000 1000 0.418 0.03 表 2 HPHT预处理-辐照-真空退火样品的残余应力及表观电荷态比
Table 2. Residual stress and apparent charge-state ratio of samples treated by HPHT pretreatment, electron irradiation and vacuum annealing
Sample Tp/℃ Ta/℃ $ {\sigma }_{\text{h}} $/GPa $ {R}_{i} $ Sample Tp/℃ Ta/℃ $ {\sigma }_{\text{h}} $/GPa $ {R}_{i} $ A800 800 0.451 3.35 AVA600 1900 600 0.355 3.39 APA1100 1100 800 0.964 0.47 AVA700 1900 700 0.383 1.15 APA1300 1300 800 0.606 0.51 AVA800 1900 800 0.310 2.58 APA1500 1500 800 0.416 0.85 AVA900 1900 900 0.370 0.44 APA1700 1700 800 0.470 1.45 AVA1000 1900 1000 0.389 0.58 -
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