Shock Temperature Measurement of Transparent Materials

Under shock compressions, a few special crystal materials have very small absorptance. This means that although they stand in high temperature states on, temperatures can not be detected by using optical radiation techniques because of the low emissivity. In this paper, an optical radiation technique for measuring temperature of very low emissive material under shock compression is proposed based on the analysis of the thermal diffusion at the interface of sample and thin film. To test this technique, temperature of crystal NaCl at shock pressure 41 GPa was measured. The result agrees with the results of Kormer, et al. This shows that this technique is feasible and can be used to measure shock temperatures of low emissive materials.