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ZHANG Hai-Feng, LI Yong-Ping, HUANG Xin-Tang. MoSi2 Band Gap Modulation at High Pressure[J]. Chinese Journal of High Pressure Physics, 1994, 8(3): 200-204 . doi: 10.11858/gywlxb.1994.03.007
Citation: ZHANG Hai-Feng, LI Yong-Ping, HUANG Xin-Tang. MoSi2 Band Gap Modulation at High Pressure[J]. Chinese Journal of High Pressure Physics, 1994, 8(3): 200-204 . doi: 10.11858/gywlxb.1994.03.007

MoSi2 Band Gap Modulation at High Pressure

doi: 10.11858/gywlxb.1994.03.007
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  • Corresponding author: ZHANG Hai-Feng
  • Received Date: 27 Jul 1993
  • Rev Recd Date: 14 Dec 1993
  • Publish Date: 05 Sep 1994
  • The electronic structure of transition metal disilicides MoSi2 at high pressure was studied by using LMTO-ASA method. All the relativistic effects except spin-orbit coupling were considered. The results indicate that, with the compressibility increasing, the width of valence band became wider which shows the interaction between Mo d electrons and Si p electrons became larger, the cohesion of crystal increases. Should we say that, this result is conflict to the rule of metallization of nonconductors at high pressure.

     

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