串联战斗部前级K装药结构的优化设计

陈闯; 李伟兵; 王晓鸣; 李文彬; 吴巍

doi:10.11858/gywlxb.2014.01.012

串联战斗部前级K装药结构的优化设计

doi: 10.11858/gywlxb.2014.01.012

1.
南京理工大学智能弹药技术国防重点学科实验室，江苏南京 210094
2.
中国人民解放军63863部队，吉林白城 137001

基金项目: 国家自然科学基金(11202103)；江苏省普通高校研究生科研创新计划项目(CXZZ11_0268)

详细信息

作者简介:
陈闯(1987－), 男, 博士研究生, 主要从事战斗部设计及目标毁伤技术研究. E-mail:chenchuang517@126.com

中图分类号: O385;TJ410.3
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出版历程
- 收稿日期: 2012-03-27
- 修回日期: 2012-08-29

Optimization Design of Precursor K-Charge Structure of Tandem Warhead

1.
ZNDY of Ministerial Key Laboratory, Nanjing University of Science and Technology, Nanjing 210094, China
2.
Unit 63863 of PLA, Baicheng 137001, China

摘要

摘要: 针对串联战斗部前级装药大开孔兼顾侵深的要求，应用LS-DYNA有限元软件，结合正交优化设计方法，仿真研究了K装药的药型罩及隔板结构参数对高速聚能杆式射流成型的影响规律，找出了形成较高头部速度的聚能杆式射流的药型罩外壁曲率半径和偏心距(分别为90~110 mm和35~40 mm)。计算得到了各结构参数(偏心距、罩外壁曲率半径、壁厚、隔板直径、张角、锥角)对聚能杆式侵彻体成型指标(头部速度和头尾速度差)影响的主次顺序，获得了K装药结构参数的最佳组合。进行了X光成像及侵彻钢靶实验，侵深达到装药口径的3.73倍，侵彻孔径为装药口径的0.36倍，侵彻孔径较均匀。数值模拟结果与实验结果吻合较好，研究结果为串联聚能装药技术的进一步研究提供了参考依据。
- K装药 /
- 串联战斗部 /
- 聚能杆式射流 /
- 正交优化 /
- 数值模拟
Abstract: Aimed at the requirement of large hole diameter and deep penetration depth of tandem warhead precursor charge, by using LS-DYNA finite element software and orthogonal optimal design method, the influence law of the liner and foam structural parameters of K-charge on the formation of the shaped jet was studied.The relatively high tip velocity was gained, when the liner curvature radius was selected within a range between 90 and 110 mm, and the eccentricity was taken between 35 and 40 mm.The influence sequence of the structural parameters, including eccentricity, curvature radius, thickness, foam diameter, opening angle, and cone angle, on the jet formation indexes (tip velocity, tip and tail velocity difference) was obtained, and the optimal combination of K-charge structural parameters was acquired.The X-ray imaging and steel penetration experiments were also carried out.The experimental results show that the penetration depth and hole diameter reach 3.73 and 0.36 times of charge diameter, respectively, and the penetration hole is relatively homogenous.The simulation results are in good agreement with the experimental results, which provides a reference for the further study of tandem shaped charge technique.
- K-charge /
- tandem warhead /
- shaped charge jet /
- orthogonal optimize /
- numerical simulation

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图 1(a) K装药结构

Figure 1(a). Structure of K-charge

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图 1(b) 爆轰波形

Figure 1(b). Detonation wave

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图 2 60 μs时头部速度随r₁和a的变化

Figure 2. Variation of tip velocity with r₁ and a at 60 μs

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图 3 各因素中的各个水平对v_tip和Δv的影响

Figure 3. Effects of factor levels on v_tip and Δv

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表 1 正交试验的各因素水平表

Table 1. Factor levels in orthogonal test

Factor level	Factor
Factor level	a/(mm)	r₁/(mm)	h/(mm)	D_g/D_k	α/(°)	β/(°)
1	35	90	2.2	0.70	3	50
2	36	95	2.4	0.75	4	55
3	37	100	2.6	0.80	5	60
4	38	105	2.8	0.85	6	65
5	39	110	3.0	0.90	7	70

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表 2 L25正交阵列各方案的计算结果

Table 2. Results of simulation scheme using L25 orthogonal array

Project	L_a	L_r₁	L_h	L_{D_g}	L_α	L_β	v_tip/(m/s)	v_tail/(m/s)	Δv /(m/s)
1	1	1	1	1	1	1	5 893	1 445	4 448
2	1	2	2	2	2	2	5 550	1 605	3 945
3	1	3	3	3	3	3	5 480	1 779	3 701
4	1	4	4	4	4	4	5 415	1 943	3 472
5	1	5	5	5	5	5	5 432	2 039	3 393
6	2	1	2	3	4	5	5 906	1 380	4 526
7	2	2	3	4	5	1	5 746	1 549	4 197
8	2	3	4	5	1	2	5 482	1 711	3 771
9	2	4	5	1	2	3	4 909	1 732	3 177
10	2	5	1	2	3	4	5 723	2 214	3 509
11	3	1	3	5	2	4	5 672	1 226	4 446
12	3	2	4	1	3	5	5 319	1 414	3 905
13	3	3	5	2	4	1	5 205	1 562	3 643
14	3	4	1	3	5	2	5 842	2 062	3 780
15	3	5	2	4	1	3	5 641	2 118	3 523
16	4	1	4	2	5	3	5 734	1 298	4 436
17	4	2	5	3	1	4	5 375	1 406	3 969
18	4	3	1	4	2	5	6 121	2 410	3 711
19	4	4	2	5	3	1	5 739	1 988	3 751
20	4	5	3	1	4	2	5 287	1 996	3 291
21	5	1	5	4	3	2	5 921	1 335	4 586
22	5	2	1	5	4	3	6 255	1 529	4 726
23	5	3	2	1	5	4	5 608	1 606	4 002
24	5	4	3	2	1	5	5 295	1 749	3 546
25	5	5	4	3	2	1	5 346	1 894	3 452

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表 3 各个指标的极差

Table 3. Extreme differences of different indexes

Factor	S_vtip/(m/s)	S_Δv/(m/s)
a	149.2	270.6
r₁	385.2	1 054.8
h	598.4	281.2
D_g	365.6	252.8
α	152.8	215.4
β	57.8	96.4

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表 4 正交优化后K装药结构仿真与实验结果的对比(60 μs)

Table 4. Comparison of simulated and experimental results for K-charge based on the orthogonal design (60 μs)

Process	Method	Picture	v_tip/(m/s)	v_tail/(m/s)	P/(mm)	D_h/(mm)
Formation	Sim.		5 846	1 764
Formation	Exp.		5 628	1 520
Penetration	Sim.				428	36
Penetration	Exp.				410	40

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参考文献(9)

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