金刚石膜厚度尺寸对热残余应力的影响

唐达培 高庆 吴兰鹰

唐达培, 高庆, 吴兰鹰. 金刚石膜厚度尺寸对热残余应力的影响[J]. 高压物理学报, 2007, 21(3): 316-321 . doi: 10.11858/gywlxb.2007.03.017
引用本文: 唐达培, 高庆, 吴兰鹰. 金刚石膜厚度尺寸对热残余应力的影响[J]. 高压物理学报, 2007, 21(3): 316-321 . doi: 10.11858/gywlxb.2007.03.017
TANG Da-Pei, GAO Qing, WU Lan-Ying. Effect of Diamond Films Thickness on Thermal Residual Stress[J]. Chinese Journal of High Pressure Physics, 2007, 21(3): 316-321 . doi: 10.11858/gywlxb.2007.03.017
Citation: TANG Da-Pei, GAO Qing, WU Lan-Ying. Effect of Diamond Films Thickness on Thermal Residual Stress[J]. Chinese Journal of High Pressure Physics, 2007, 21(3): 316-321 . doi: 10.11858/gywlxb.2007.03.017

金刚石膜厚度尺寸对热残余应力的影响

doi: 10.11858/gywlxb.2007.03.017
详细信息
    通讯作者:

    唐达培

Effect of Diamond Films Thickness on Thermal Residual Stress

More Information
    Corresponding author: TANG Da-Pei
  • 摘要: 采用有限元方法对钼基体上不同厚度(20~1 000 m)金刚石膜的热残余应力进行了全面的模拟与分析,得出了它们在膜内分布的等值线图,研究了金刚石膜厚度尺寸对整个膜内的最大主拉应力和界面处每个应力分量最大值的影响。结果表明:在整个膜内,最大主拉应力的位置出现在膜的表面、界面或侧面,其值随膜厚度的增加而增大;在界面处,最大轴向应力随膜厚度的增加而增大,而最大径向压应力、最大周向压应力和最大剪应力则随膜厚度的增加而减小,其中最大剪应力减幅较小;膜厚度越大时,以上各量随厚度增(减)的速度越慢。其结论对于在金刚石膜的制备中合理地选择厚度、有效地进行应力控制有一定的参考价值。

     

  • Tang B Y, Jin J Ch, Li Sh L, et al. Study on Stress in Chemical Vapor Deposited(CVD) Diamond Films [J]. Chinese Journal of High Pressure Physics, 1997, 11(1): 56-59. (in Chinese)
    唐壁玉, 靳九成, 李绍绿, 等. CVD金刚石薄膜的应力研究 [J]. 高压物理学报, 1997, 11(1): 56-59.
    Chen G Ch, Li Ch M, Zhang H D, et al. Structural Analysis of Cracked Diamond Films Grown by DC Plasma Jet during Detachment [J]. Journal of Synthetic Crystals, 2003, 32(5): 518-523. (in Chinese)
    陈广超, 李成明, 张恒大, 等. 直流等离子体法中脱膜开裂的金刚石膜组织结构分析 [J]. 人工晶体学报, 2003, 32(5): 518-523.
    Kosky P G, Anthony T R. Fracture-Free Release of CVD Diamond [J]. Diamond and Related Materials, 1996, 5: 1313-1357.
    Nakamura Y. Measurement of Internal Stress in CVD Diamond Films [J]. Thin Solid Films, 1997, 308-309: 249-253.
    Kim J G, Jin Y. Characterisation of CVD Grown Diamond and Its Residual Stress State [J]. Mater Sci Eng, 1998, B57: 24-27.
    Baik Y J, Lee J K, Lee W S, et al. Large Area Deposition of Thick Diamond Film by Direct-Current PACVD [J]. Thin Solid Films, 1999, 341: 202-206.
    Huang T B, Liu J M, Zhong G F, et al. Preparation of Large Area Free Standing Thick Diamond Wafers [J]. Journal of University of Science and Technology Beijing, 2000, 22(3): 234-237 (in Chinese)
    黄天斌, 刘敬明, 钟国仿, 等. 大面积无衬底自支撑金刚石厚膜沉积 [J]. 北京科技大学学报, 2000, 22(3): 234-237.
    Jeong J H, Lee S Y, Lee W S, et al. Mechanical Analysis for Crack-Free Release of Chemical-Vapor-Deposited Diamond Wafers [J]. Diamond and Related Materials, 2002, 11: 1597-1605.
    Fu Y, Du H, Sun C Q. Interfacial Structure, Residual Stress and Adhesion of Diamond Coatings Deposited on Titanium [J]. Thin Solid Films, 2003, 424: 107-114.
    Windischmann H, Gray K J. Stress Measurement of CVD Diamond Films [J]. Diamond and Related Materials, 1995, 4: 837-842.
    Slack G A, Bartram S F. Thermal Expansion of Some Diamond-Like Crystals [J]. J Appl Phys, 1975, 46: 89-98.
    Ager Ⅲ J W, Drory M D. Quantitative Measurement of Residual Biaxial Stress by Raman Spectroscopy in Diamond Grown on a Ti Alloy by Chemical Vapor Deposition [J]. Phys Rev B, 1993, 48: 2601.
    Yang J X, Li C M, Chen G C, et al. Analysis of Residual Stress Distribution in DC Arc Plasma Jet CVD High Quality Diamond Films by Raman Spectroscopy [J]. Journal of Synthetic Crystals. 2004, 33(4): 674-678.
    Ma B X, Yao N, Jia Y, et al. Influence of Structure on Adhesion of Grains in CVD Diamond Films [J]. Acta Physica Sinica, 2005, 54(6): 2853-2858. (in Chinese)
    马丙现, 姚宁, 贾瑜, 等. 金刚石薄膜的结构特征对薄膜附着性能的影响 [J]. 物理学报, 2005, 54(6): 2853-2858.
  • 加载中
计量
  • 文章访问数:  7714
  • HTML全文浏览量:  300
  • PDF下载量:  876
出版历程
  • 收稿日期:  2006-10-26
  • 修回日期:  2007-01-15
  • 发布日期:  2007-09-05

目录

    /

    返回文章
    返回