氮化碳薄膜的制备及研究现状

宋银 侯明东 王志光 赵志明 段敬来

宋银, 侯明东, 王志光, 赵志明, 段敬来. 氮化碳薄膜的制备及研究现状[J]. 高压物理学报, 2003, 17(4): 311-318 . doi: 10.11858/gywlxb.2003.04.012
引用本文: 宋银, 侯明东, 王志光, 赵志明, 段敬来. 氮化碳薄膜的制备及研究现状[J]. 高压物理学报, 2003, 17(4): 311-318 . doi: 10.11858/gywlxb.2003.04.012
SONG Yin, HOU Ming-Dong, WANG Zhi-Guang, ZHAO Zhi-Ming, DUAN Jing-Lai. Synthesis and Study Status of Carbon Nitride Thin Film[J]. Chinese Journal of High Pressure Physics, 2003, 17(4): 311-318 . doi: 10.11858/gywlxb.2003.04.012
Citation: SONG Yin, HOU Ming-Dong, WANG Zhi-Guang, ZHAO Zhi-Ming, DUAN Jing-Lai. Synthesis and Study Status of Carbon Nitride Thin Film[J]. Chinese Journal of High Pressure Physics, 2003, 17(4): 311-318 . doi: 10.11858/gywlxb.2003.04.012

氮化碳薄膜的制备及研究现状

doi: 10.11858/gywlxb.2003.04.012
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    通讯作者:

    宋银

Synthesis and Study Status of Carbon Nitride Thin Film

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    Corresponding author: SONG Yin
  • 摘要: 氮化碳具有良好的物理、化学性质和广泛的应用前景。目前主要采用化学气相沉积法、离子束溅射法、激光等离子体沉积和激光烧蚀、离子镀、离子注入法等制备方法。文中对氮化碳的结构、性质、制备、性能表征以及研究现状进行了比较详细的介绍。

     

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出版历程
  • 收稿日期:  2002-12-18
  • 修回日期:  2003-03-12
  • 发布日期:  2003-12-05

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