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Chinese Journal of High Pressure Physics  > 1997  >  11(1): 56-60 .
TANG Bi-Yu, Jin Jiu-Cheng, LI Shao-Lü, ZHOU Ling-Ping, CHEN Zong-Zhang. Study on Stress in Chemical Vapor Deposite (CVD) Diamond Films[J]. Chinese Journal of High Pressure Physics, 1997, 11(1): 56-60 . doi: 10.11858/gywlxb.1997.01.010
Citation: TANG Bi-Yu, Jin Jiu-Cheng, LI Shao-Lü, ZHOU Ling-Ping, CHEN Zong-Zhang. Study on Stress in Chemical Vapor Deposite (CVD) Diamond Films[J]. Chinese Journal of High Pressure Physics, 1997, 11(1): 56-60 . doi: 10.11858/gywlxb.1997.01.010
shu

Study on Stress in Chemical Vapor Deposite (CVD) Diamond Films

doi: 10.11858/gywlxb.1997.01.010
  • 1.

    Department of Chemistry and Chemical Engineering, Hunan University, Changsha 410082, China;

  • 2.

    Material Test and Research Center, Hunan University, Changsha 410082, China

More Information
  • Corresponding author: TANG Bi-Yu
  • Received Date: 01 Jul 1996
  • Rev Recd Date: 02 Oct 1996
  • Publish Date: 05 Mar 1997
    Abstract
  • The stress in diamond films by the hot filament assisted chemical vapor deposition process was studied by X-ray diffraction technique. The investigation shows that the thermal stress is compressive in the temperature range studied and the intrinsic stress is tensile. The influence of various experimental parameters on the stress in films was analyzed.

     

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